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Heng-Jen Lee
Heng-Jen Lee
Photronics, Inc.
Etching
Materials science
Optoelectronics
Photomask
Wafer
4
Papers
1
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0
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A study of airborne molecular contamination to Cr etching process
2019
Yuan Hsu
Yutaka Satou
Heng-Jen Lee
Zack Huang
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Practical lithography hotspot identification using mask process model
2019
Pai Chi Chen
Chain Ting Huang
Shang Feng Weng
Yung-Feng Cheng
Young Ham
Colbert Lu
Michael Green
Mohamed Ramadan
Heng-Jen Lee
Chris Progler
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The Study of Mask Crosstalk Defects from Developer and Etching
2019
CSTIC | China Semiconductor Technology International Conference
Heng-Jen Lee
Yuan Hsu
Jackie Cheng
Mei-Yu Liu
Colbert Lu
Tomas Chin
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Characterization of quartz etched depth and optical density of opaque pattern for the wafer CD behavior on advanced mask
2019
William Chou
Jeffrey Cheng
C. H. Twu
Adder Lee
Chih Hsuan Chao
Xin Ren Yu
Po Tsang Chen
Edgar Huang
Junjin Lin
Sweet Chen
James Cheng
Colbert Lu
Josh Tzeng
Jackie Cheng
Heng-Jen Lee
Young Ham
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