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Akemi Miwa
Akemi Miwa
Topcon Corporation
Miniaturization
Laser exposure
Lithography
Mask inspection
Photolithography
2
Papers
3
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0
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Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
2004
Toru Tojo
Ryoich Hirano
Hideo Tsuchiya
Junji Oaki
Takeshi Nishizaka
Yasushi Sanada
Kazuto Matsuki
Ikunao Isomura
Riki Ogawa
Noboru Kobayashi
Kazuhiro Nakashima
Shinji Sugihara
Hiromu Inoue
Shinichi Imai
Hitoshi Suzuki
Akihiko Sekine
Makoto Taya
Akemi Miwa
Nobuyuki Yoshioka
Katsumi Ohira
Dong-Hoon Chung
Masao Otaki
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Citations (2)
Advanced mask inspection optical system (AMOS) using 198.5nm wavelength for 65nm (hp) node and beyond: System development and initial state D/D inspection performance
2004
Toru Tojo
Ryoich Hirano
Hideo Tsuchiya
Junji Oaki
Takeshi Nishizaka
Yasushi Sanada
Kazuto Matsuki
Ikunao Isomura
Riki Ogawa
Noboru Kobayashi
Kazuhiro Nakashima
Shinji Sugihara
Hiromu Inoue
Shinichi Imai
Hitoshi Suzuki
Akihiko Sekine
Makoto Taya
Akemi Miwa
Nobuyuki Yoshioka
Katsumi Ohira
Dong-Hoon Chung
Masao Otaki
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Citations (1)
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