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Kazuhiro Nakashima
Kazuhiro Nakashima
Toshiba
Mask inspection
Engineering
Miniaturization
Laser exposure
Lithography
3
Papers
3
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0
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Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
2004
Toru Tojo
Ryoich Hirano
Hideo Tsuchiya
Junji Oaki
Takeshi Nishizaka
Yasushi Sanada
Kazuto Matsuki
Ikunao Isomura
Riki Ogawa
Noboru Kobayashi
Kazuhiro Nakashima
Shinji Sugihara
Hiromu Inoue
Shinichi Imai
Hitoshi Suzuki
Akihiko Sekine
Makoto Taya
Akemi Miwa
Nobuyuki Yoshioka
Katsumi Ohira
Dong-Hoon Chung
Masao Otaki
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Citations (2)
Advanced mask inspection optical system (AMOS) using 198.5nm wavelength for 65nm (hp) node and beyond: System development and initial state D/D inspection performance
2004
Toru Tojo
Ryoich Hirano
Hideo Tsuchiya
Junji Oaki
Takeshi Nishizaka
Yasushi Sanada
Kazuto Matsuki
Ikunao Isomura
Riki Ogawa
Noboru Kobayashi
Kazuhiro Nakashima
Shinji Sugihara
Hiromu Inoue
Shinichi Imai
Hitoshi Suzuki
Akihiko Sekine
Makoto Taya
Akemi Miwa
Nobuyuki Yoshioka
Katsumi Ohira
Dong-Hoon Chung
Masao Otaki
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Citations (1)
High-performance DUV inspection system for 100-nm generation masks
2002
Hideo Tsuchiya
Ikunao Isomura
Kazuhiro Nakashima
Kyoji Yamashita
Toshiyuki Watanabe
Takeshi Nishizaka
Hiroyuki Ikeda
Eiji Sawa
Masami Ikeda
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