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Noboru Kobayashi
Noboru Kobayashi
Optics
Miniaturization
Photolithography
Laser exposure
Lithography
2
Papers
2
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0
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2024
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Advanced mask inspection optical system (AMOS) using 198.5nm wavelength for 65nm (hp) node and beyond: System development and initial state D/D inspection performance
2004
Toru Tojo
Ryoich Hirano
Hideo Tsuchiya
Junji Oaki
Takeshi Nishizaka
Yasushi Sanada
Kazuto Matsuki
Ikunao Isomura
Riki Ogawa
Noboru Kobayashi
Kazuhiro Nakashima
Shinji Sugihara
Hiromu Inoue
Shinichi Imai
Hitoshi Suzuki
Akihiko Sekine
Makoto Taya
Akemi Miwa
Nobuyuki Yoshioka
Katsumi Ohira
Dong-Hoon Chung
Masao Otaki
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Development of a mask-scan electron beam mask writer
2002
Journal of Vacuum Science & Technology B
Shinsuke Nishimura
Mitsuko Shimizu
Soichiro Mitsui
Kiminobu Akeno
Hideo Kusakabe
Munehiro Ogasawara
Ryuji Hayashi
Shinji Yanaga
Noboru Kobayashi
Toru Tojo
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