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Martin Plihal

KLA-Tencor

5

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8

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High-throughput, nondestructive assessment of defects in patterned epitaxial films on silicon by machine learning-enabled broadband plasma optical measurements

2019 ASMC | Advanced Semiconductor Manufacturing Conference
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Mise en forme d'échantillons de production préservant la re-normalisabilité

2015
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Surveillance d'une performance de classification de défaut variant dans le temps

2010
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