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Paul M. Feeney

7

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Welcome letter

2015 IEEE International Conference on Industry Applications
- Paul M. Feeney
- Robert L. Rhoades
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Modeling for pad wear control during conditioning in CMP

2011
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Composition polissante contenant une polyether amine

2007
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9:20-9:40 "A Case Study for Fixed Abrasives in CMP: Production Acceptance of a New Technology through Performance, Persistence and Partnerships,"

2006
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Analysis of Large Particle Count in Fumed Silica Slurries and Its Correlation with Scratch Defects Generated by CMP

2006 Journal of The Electrochemical Society
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