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Oreste Donzella
Oreste Donzella
KLA-Tencor
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Manufacturing engineering
Lithography
Photoresist
Nanotechnology
3
Papers
2
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The emergence of inline screening for high volume manufacturing
2021
Oreste Donzella
John C. Robinson
Kara Sherman
Justin Lach
Mike von Den Hoff
Barry Saville
Thomas Groos
Alex Lim
Price David W
Jay Rathert
Chet Lenox
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Immersion lithography process improvements by wafer edge inspection at 300mm DRAM manufacturing fab
2010
ISSM | International Symposium on Semiconductor Manufacturing
Marlene Strobl
Calvin Hsu
Yu Chen Lin
Howard Chen
Damian Chen
Alex Cheng
WonGun Lee
Steve Lin
Oreste Donzella
Ribi Leung
Jennifer Kopp
Becky Pinto
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Defect learning with 193-nm resists
2004
Iris Maege
Beatrix Pinter
Martin Tuckermann
Oreste Donzella
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Citations (2)
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