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Miso Kim
Miso Kim
Hongik University
Atomic layer deposition
Materials science
Selectivity
Ethanethiol
Thin film
3
Papers
5
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0
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Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al2O3 with a Series of Alcohol Oxidants
2021
Journal of Physical Chemistry C
Seung Gi Seo
Whang Je Woo
Yujin Lee
Hwi Yoon
Miso Kim
Il Kwon Oh
Seung-min Chung
Hyungjun Kim
Bonggeun Shong
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Effects of Al Precursors on the Characteristics of Indium-Aluminum Oxide Semiconductor Grown by Plasma-Enhanced Atomic Layer Deposition.
2021
ACS Applied Materials & Interfaces
Seung-Hee Lee
Miso Kim
Geumbi Mun
Jong-Beom Ko
Hye-In Yeom
Gwang-Heum Lee
Bonggeun Shong
Sang-Hee Ko Park
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Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 using Ethanethiol Inhibitor
2020
Chemistry of Materials
Hyun Gu Kim
Miso Kim
Bonwook Gu
Mohammad Rizwan Khan
Byeong Guk Ko
Sumaira Yasmeen
Chang Su Kim
Se-Hun Kwon
Jiyong Kim
Junhyuck Kwon
Kwangseon Jin
Byungchul Cho
Jinsung Chun
Bonggeun Shong
Han Bo Ram Lee
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Citations (4)
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