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Tadaharu Watanabe
Tadaharu Watanabe
Advanced Technology Center
Chemistry
Inorganic chemistry
Impurity
Chromatography
Ammonia
5
Papers
25
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Impurities in hydride gases. Part 2: Investigation of trace CO2 in the liquid and vapor phases of ultra-pure ammonia
2004
Journal of Electronic Materials
Hans H. Funke
Jon Welchhans
Tadaharu Watanabe
Robert Torres
Virginia H. Houlding
Mark W. Raynor
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Citations (9)
Developments in abatement technology for MOCVD processing
2004
Journal of Crystal Growth
Joseph Sweeney
Paul Marganski
Karl W. Olander
Tadaharu Watanabe
Nobuyasu Tomita
Gary Orlando
Robert Torres
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Performance of single use purifiers vs. regenerable purifiers for growth of high brightness gallium nitride LEDs
2004
Journal of Crystal Growth
Robert Torres
Tadaharu Watanabe
Joseph V. Vininski
Dave Lawrence
Zhihong Yang
Wen Wang
John Garcia
C. H. Yan
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Contamination control in gas delivery systems for MOCVD
2003
Journal of Crystal Growth
Tadaharu Watanabe
Hans H. Funke
Robert Torres
Mark W. Raynor
Joseph V. Vininski
Virginia H. Houlding
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Citations (15)
Measurement and Control of Trace Carbon Dioxide in Ultra-High Purity Ammonia for the Semiconductor Industry
2002
Mark W. Raynor
Douglas Sims
Jon Welchhans
Ryan Kubicek
Tadaharu Watanabe
Robert Torres
Virginia H. Houlding
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