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takahiro okamoto

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Chemical mechanical polishing pad and chemical mechanical polishing method using the same

2011
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Polyurethane and the polishing layer forming composition containing the same, as well as chemical mechanical polishing pad and chemical mechanical polishing method using the same

2010
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化学機械研磨用パッド、化学機械研磨用積層体パッド、および化学機械研磨方法

2007
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