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Crid Yu

University of California, Berkeley

11

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116

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Patterning tool characterization by causal variability decomposition

1996 ISSM | International Symposium on Semiconductor Manufacturing
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Contributions of stepper lenses to systematic CD errors within exposure fields

1995
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Use of short-loop electrical measurements for yield improvement

1995 IEEE Transactions on Semiconductor Manufacturing
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Effect of Reticle Erros on Systematic Intrafield Line Width Variations

1995 Japanese Journal of Applied Physics
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Intrafield linewidth variances in 0.25 μm i‐line lithography

1995 Journal of Vacuum Science & Technology B
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Trench doping conformality by plasma immersion ion implantation (PIII)

1994 IEEE Electron Device Letters
- Crid Yu
- N.W. Chenng
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Citations (42)
Concurrent Circuit Design/Process Engineering in a

1993
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