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Materials science
Chemical engineering
Chemical vapor deposition
Catalysis
Inorganic chemistry
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The plasma processing apparatus and microcrystalline silicon film forming method
2010
teizi wakamatu
kouzi kamezaki
kikuti masasi
masasi kikuti
yangjieshenbao
kenzi etou
sin asari
neitiankuanren
hiroto utida
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Cat-CVD 法を用いて成膜したSiNx膜における水素添加の効果
2007
tooru kokorozasi fuzinaga
yuuko yamamoto
makiko takagi
yukinori hasimoto
sin asari
kazuya saitou
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Self-cleaning catalytic chemical vapor deposition apparatus and its cleaning method
2005
makiko kitazoe
Dayuanxiu Si
syuuzi oosono
itou hiromi
hiromi itou
kazuya saitou
saitou kazuya
sin asari
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大面積 Catalytic Chemical Vapor Deposition 装置の開発
2004
Journal of The Vacuum Society of Japan
syuuzi oosono
yuuzi utiyama
hideo tuboi
sin asari
kazuya saitou
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