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Walt Hacker
Walt Hacker
Ion implantation
Capacitor
Plasma
Electric arc
Doping
1
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High density plasma flood system for wafer charge neutralisation
1999
Hiroyuki Ito
Hiroshi Asechi
Yasuhiko Matsunaga
Masahiko Niwayama
Kenji Yoneda
M. C. Vella
Mike Reilly
Walt Hacker
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