Old Web
English
Sign In
Acemap
>
authorDetail
>
Fuyuhiko Matsuo
Fuyuhiko Matsuo
Engineering
Lithography
Optics
Mask inspection
Photolithography
5
Papers
4
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Defect printability and inspection capability for tri-tone PSM
2003
Yoshikazu Nagamura
Kazuyuki Maetoko
Kiyoshi Maeshima
Naohisa Tamada
Kunihiro Hosono
Masaya Fujimoto
Yutaka Kodera
Koji Goto
Tsuyoshi Narita
Fuyuhiko Matsuo
Shinji Akima
Mikio Ishijima
Hironobu Iwasaki
Yasutaka Kikuchi
Show All
Source
Cite
Save
Citations (1)
DUV inspection capability for 90-nm node mask in ArF lithography
2003
Katsumi Ohira
Byung-Gook Kim
Keishi Tanaka
Nobuyuki Yoshioka
Motonari Tateno
Naohisa Takayama
Shingo Murakami
Keiichi Hatta
Shinji Akima
Fuyuhiko Matsuo
Masao Otaki
Show All
Source
Cite
Save
Citations (0)
Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
2003
Motonari Tateno
Naohisa Takayama
Shingo Murakami
Keiichi Hatta
Shinji Akima
Fuyuhiko Matsuo
Masao Otaki
Byung-Gook Kim
Keishi Tanaka
Nobuyuki Yoshioka
Show All
Source
Cite
Save
Citations (1)
Pattern shape analysis tool for quantitative estimate of photomask and process
2001
Isao Yonekura
Yuhichi Fukushima
Fuyuhiko Matsuo
Masao Otaki
Norihito Fukugami
Show All
Source
Cite
Save
Citations (1)
Pattern shape analysis tool for defect judgement of photomask
2000
Fuyuhiko Matsuo
Masao Otaki
Norihito Fukugami
Isao Yonekura
Yuhichi Fukushima
Show All
Source
Cite
Save
Citations (1)
1