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Stephen W. Russell
Stephen W. Russell
Texas Instruments
Electronic engineering
Capacitance
Metallurgy
Dielectric
Materials science
4
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45
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Améliorations dans ou relatives à des structures diélectriques poreuses
1998
Robert H. Havemann
Changming Jin
Wei William Lee
Richard Scott List
Jiong-Ping Lu
Stephen W. Russell
Kelly J. Taylor
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Damascene integration of copper and ultra-low-k xerogel for high performance interconnects
1997
IEDM | International Electron Devices Meeting
Eden Zielinski
Stephen W. Russell
Richard Scott List
A. M. Wilson
C Jin
K. J. Newton
Jiong-Ping Lu
T. Hurd
Wei-Yung Hsu
V. T. Cordasco
M. Gopikanth
V. Korthuis
Wei William Lee
G. Cerny
N.M. Russell
Patricia B. Smith
Robert H. Havemann
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Citations (23)
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