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D. D. Sieloff
D. D. Sieloff
Freescale Semiconductor
Analytical chemistry
Ion
Beam (structure)
Chemistry
Surface roughness
3
Papers
4
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A novel approach for measuring ultra‐thin, buried SiO2 film thickness
2009
Surface and Interface Analysis
Z. X. Jiang
D. D. Sieloff
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Toward accurate characterization of nitrogen depth profiles in ultrathin oxynitride films
2008
Surface and Interface Analysis
Z. X. Jiang
K. Kim
D. D. Sieloff
Tien Ying Luo
A. Varghese
D. H. Triyoso
T. Guenther
B. Robichaud
J. Benavides
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Low energy secondary ion mass spectrometry with sub-keV O2+ beams at glancing incidence
2008
Journal of Vacuum Science and Technology
Z. X. Jiang
K. Kim
T. Guenther
B. Robichaud
J. Benavides
L. Contreras
D. D. Sieloff
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Citations (2)
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