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Michael J. Hartig
Michael J. Hartig
Motorola
Inductively coupled plasma
Analytical chemistry
Chemistry
Materials science
Plasma
4
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3
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Ion implant data log analysis for process control and fault detection
2002
Michael J. Rendon
David Sing
Marcy Beard
Michael J. Hartig
John C. Arnold
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Validation Issues in Oxide Etch Plasma Source Models
1999
P. Ventzek
S. Rauf
D. G. Coronell
Valli Arunachalam
T. Sparks
Michael J. Hartig
H. Anderson
K. Waters
Helen H. Hwang
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Inductively coupled plasma reactor and method thereof
1997
John C. Arnold
Michael J. Hartig
jon sii aanorudo
maikeru ziei haateingu
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Method with an inductively coupled plasma reactor
1997
John C. Arnold
Michael J. Hartig
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