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Validation Issues in Oxide Etch Plasma Source Models
Validation Issues in Oxide Etch Plasma Source Models
1999
P. Ventzek
S. Rauf
D. G. Coronell
Valli Arunachalam
T. Sparks
Michael J. Hartig
H. Anderson
K. Waters
Helen H. Hwang
Keywords:
Plasma
Oxide
Materials science
Optoelectronics
Correction
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