Old Web
English
Sign In
Acemap
>
authorDetail
>
Takao Kamoshima
Takao Kamoshima
Renesas Electronics
Materials science
Electronic engineering
Time-dependent gate oxide breakdown
Dielectric strength
Reliability engineering
5
Papers
26
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Comprehensive TDDB lifetime prediction methodology for intrinsic and extrinsic failures in Cu interconnect dielectrics
2013
Microelectronic Engineering
Naohito Suzumura
M. Ogasawara
Kazuya Makabe
Takao Kamoshima
T. Ouchi
Takeshi Furusawa
E. Murakami
Show All
Source
Cite
Save
Citations (5)
Comprehensive lifetime prediction for intrinsic and extrinsic TDDB failures in Cu/Low-k interconnects
2011
IITC | International Interconnect Technology Conference
Naohito Suzumura
M. Ogasawara
Kazuya Makabe
Takao Kamoshima
T. Ouchi
S. Yamamoto
Takeshi Furusawa
E. Murakami
Show All
Source
Cite
Save
Citations (3)
Constant field stressing of via-to-line spacing for accurate projection of intrinsic TDDB lifetime
2009
IITC | International Interconnect Technology Conference
Takao Kamoshima
Kazuya Makabe
Masatsugu Amishiro
Takeshi Furusawa
Yoshifumi Takata
M. Ogasawara
Show All
Source
Cite
Save
Citations (6)
Controlling Ambient Gas in Slot-to-Slot Space Inside FOUP to Suppress Cu-Loss After Dual Damascene Patterning
2008
IEEE Transactions on Semiconductor Manufacturing
Takao Kamoshima
Yasuhisa Fujii
Toshimitsu Noguchi
Tomonori Saeki
Yoshifumi Takata
Hironori Ochi
Akira Koiwa
Show All
Source
Cite
Save
Citations (10)
Ambient gas control in slot-to-slot space inside FOUP to suppress Cu-loss after dual damascene patterning
2007
ISSM | International Symposium on Semiconductor Manufacturing
Takao Kamoshima
Yasuhisa Fujii
Toshimitsu Noguchi
Tomonori Saeki
Yoshifumi Takata
Hironori Ochi
Akira Koiwa
Show All
Source
Cite
Save
Citations (2)
1