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T. Ouchi
T. Ouchi
Renesas Electronics
Time-dependent gate oxide breakdown
Reliability engineering
Electronic engineering
critical area analysis
Dielectric strength
4
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14
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Comprehensive TDDB lifetime prediction methodology for intrinsic and extrinsic failures in Cu interconnect dielectrics
2013
Microelectronic Engineering
Naohito Suzumura
M. Ogasawara
Kazuya Makabe
Takao Kamoshima
T. Ouchi
Takeshi Furusawa
E. Murakami
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Citations (5)
Comprehensive lifetime prediction for intrinsic and extrinsic TDDB failures in Cu/Low-k interconnects
2011
IITC | International Interconnect Technology Conference
Naohito Suzumura
M. Ogasawara
Kazuya Makabe
Takao Kamoshima
T. Ouchi
S. Yamamoto
Takeshi Furusawa
E. Murakami
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外因性欠陥により生じたCu IMD‐TDDBのモデリング
2010
IRPS | International Reliability Physics Symposium
T. Ouchi
K. Makabe
M. Ogasawara
E. Murakami
N. Yoshioka
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Modeling of Cu IMD-TDDB caused by extrinsic defects
2010
IRPS | International Reliability Physics Symposium
T. Ouchi
K. Makabe
M. Ogasawara
E. Murakami
N. Yoshioka
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Citations (6)
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