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Richard Prior
Richard Prior
Optics
Lithography
Resist
Electron-beam lithography
Electronic engineering
6
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13
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Elements of an advanced pattern generator for 130- to 100-nm maskmaking
2000
Varoujan Chakarian
Charles A. Sauer
Bassam Shamoun
Frank Chilese
David Trost
Marek Zywno
Ulrich Hofmann
Robin Teitzel
Richard Prior
Frederick Raymond
Abe Ghanbari
Frank E. Abboud
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Citations (2)
Further advances in electron-beam pattern generation technology for 180-nm masks
1998
Frank E. Abboud
Charles A. Sauer
Matthew Vernon
Thomas P. Coleman
Robert L. Dean
William Wang
Richard Prior
Maiying Lu
Suzanne Weaver
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Advanced electron-beam pattern generation technology for 180-nm masks
1997
Frank E. Abboud
Charles A. Sauer
William Wang
Matthew Vernon
Richard Prior
Henry Thomas Pearce-Percy
Damon M. Cole
Marian Mankos
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Citations (4)
MEBES© 4500 raster scan techniques: Calibration and control
1995
Microelectronic Engineering
Richard Prior
Albert Benveniste
Kent Norton
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Electron beam lithography using MEBES IV
1992
Journal of Vacuum Science & Technology B
Frank E. Abboud
Mark A. Gesley
Dave Colby
K. Comendant
Robert L. Dean
W. Eckes
D. McClure
Henry Thomas Pearce-Percy
Richard Prior
Sterling Watson
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Citations (1)
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