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L. Lu
L. Lu
STMicroelectronics
Electronic engineering
Computer science
Metal
Dielectric strength
Electromigration
2
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A Manufacturable 0.7amu;m Triple Metal Technology For High Density And High Performance ASIC Applications
1992
CICC | Custom Integrated Circuits Conference
Che Chia Wei
Frank Randolph Bryant
L. Nguyen
Y.S. Lin
F.S. Chen
G.A. Dixit
L. Lu
K. Huang
Pervez Hassan Sagarwala
J. Huang
M. Zamanian
C.R. Spinner
C.D. Waggoner
W.M. Morris
F.T. Lieu
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A 0.5 mu m diode load 4 Mb SRAM technology using double-level Al plug metal process
1991
VLSI-TSA | International Symposium on VLSI Technology, Systems, and Applications
R. Sundaresan
Che Chia Wei
Mehdi Zamanian
F.S. Chen
R.O. Miller
Robert Louis Hodges
W. Gaskins
Pervez Hassan Sagarwala
L. Nguyen
J. Huang
Charles R. Spinner
G.S. Stagaman
L. Lu
Y.S. Lin
Frank Randolph Bryant
Fu-Tai Liou
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