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Christopher E. Obszarny
Christopher E. Obszarny
IBM
Semiconductor device fabrication
Numerical aperture
Photolithography
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Lithography
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Characterization of a next-generation step-and-scan system
1998
Timothy J. Wiltshire
Joseph P. Kirk
Donald C. Wheeler
Christopher E. Obszarny
James T. Marsh
Donald M. Odiwo
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