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Kazuhisa Ishibashi
Kazuhisa Ishibashi
Sumitomo Heavy Industries
Semiconductor device fabrication
Ion implantation
Materials science
Dynamic range
Moderate-Dose
3
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Novel Technique for Production-Yield Enhancement of Semiconductor Devices
2018
EDTM | IEEE Electron Devices Technology and Manufacturing Conference
Shiro Ninomiya
Yoji Kawasaki
Yasuharu Okamoto
Kazuhisa Ishibashi
Toshio Yumiyama
Akihiro Ochi
Yusuke Ueno
Hiroyuki Kariya
Mitsuaki Kabasawa
Mitsukuni Tsukihara
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High-Accuracy Two-Dimensional Intentional Non-Uniform Dose Implant: MIND 2.0
2016
Shiro Ninomiya
Yasuharu Okamoto
Kazuhisa Ishibashi
Toshio Yumiyama
Akihiro Ochi
Yusuke Ueno
Mitsuaki Kabasawa
Mitsukuni Tsukihara
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Intentional Two-Dimensional Non-Uniform Dose Implant with High Dynamic Dose Range
2016
Kazuhisa Ishibashi
Shiro Ninomiya
Toshio Yumiyama
Akihiro Ochi
Akira Funai
Mitsuaki Kabasawa
Mitsukuni Tsukihara
Kazuyoshi Ueno
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