Novel Technique for Production-Yield Enhancement of Semiconductor Devices
2018
One of the most important issues in semiconductor manufacturing is to suppress variation of characteristics in semiconductor devices within a wafer, in order to enhance production yield. In this report, an intentional two-dimensional (2D) nonuniform ion implantation system, named the “MIND System”, is introduced and the effects of the system on suppression of some kind of variations are reviewed.
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