Old Web
English
Sign In
Acemap
>
authorDetail
>
Steve Tuan
Steve Tuan
Reticle
Lithography
Engineering
Phase-shift mask
Wafer
5
Papers
14
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Evaluation, reduction, and monitoring of progressive defects on 193-nm reticles for low-k1 process
2004
Chia Hwa Shiao
Chien-Chung Tsai
Tony Hsu
Steve Tuan
Doris Chang
Richard Chen
Frank Hsieh
Show All
Source
Cite
Save
Citations (4)
Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET
2004
W. B. Shieh
William Chou
Chuen Huei Yang
J. K. Wu
Noah Chen
Shih-Ming Yen
Tony Hsu
Steve Tuan
Doris Chang
Maciej W. Rudzinski
Lantian Wang
Kong Son
Show All
Source
Cite
Save
Citations (0)
65-nm full-chip implementation using double dipole lithography
2003
Stephen Hsu
J. Fung Chen
Noel Cororan
William T. Knose
Douglas Van Den Broeke
Thomas Laidig
Kurt E. Wampler
Xuelong Shi
Michael Hsu
Mark Eurlings
Jo Finders
Tsann-Bim Chiou
Robert John Socha
Will Conley
Yen Wu Hsieh
Steve Tuan
Frank Hsieh
Show All
Source
Cite
Save
Citations (7)
Defect printability analysis study using virtual stepper system in a production environment
2002
Shao-Yung Chiou
Henrry Lei
WeiJyh Liu
M. J. Chu
Daryl Chiang
Steve Tuan
Chia-Lung Hong
Michael Chang
Jiunn-Hung Chen
Kevin K. Chan
Qi-De Qian
Lynn Cai
Linyong Pang
Show All
Source
Cite
Save
Citations (3)
Process of manufacturing and inspection of high-end (ternary) tritone EAPSM reticles for 0.13-μm design rule generation
2002
Steve Tuan
Gidon Gottlib
Anja Rosenbusch
Show All
Source
Cite
Save
Citations (0)
1