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K. Iltgen
K. Iltgen
Analytical chemistry
Ion beam
Sputtering
Chemistry
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5
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127
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Ultrashallow secondary ion mass spectroscopy depth profiling of doping spikes and Si/SiGe/Si heterostructures using different primary species
1998
Journal of Vacuum Science & Technology B
D. Krüger
K. Iltgen
Bernd Heinemann
R. Kurps
A. Benninghoven
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Citations (7)
Ultra-shallow junction depth profile analysis using TOF-SIMS and TXRF
1998
Characterization and Metrology for ULSI Technology
K. Iltgen
Brian J. MacDonald
O. Brox
Alfred Benninghoven
Cornelia A. Weiss
Tim Z. Hossain
Ehrenfried Zschech
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Secondary ion mass spectrometry depth profiling of ultralow-energy ion implants: Problems and solutions
1998
Journal of Vacuum Science & Technology B
J. G. M. van Berkum
E. J. H. Collart
K. Weemers
D. J. Gravesteijn
K. Iltgen
A. Benninghoven
E. Niehuis
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Citations (16)
Optimized time-of-flight secondary ion mass spectroscopy depth profiling with a dual beam technique
1997
Journal of Vacuum Science and Technology
K. Iltgen
C Bendel
A. Benninghoven
E. Niehuis
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