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Hiroshi Kohno

Analysis Group

6

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26

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Detection of Metal Contamination on Silicon Wafer Backside and Edge by New TXRF Methods

2009
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Thin film characterization by total reflection x-ray fluorescence☆

2008 Spectrochimica Acta Part B: Atomic Spectroscopy
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Comparison of direct-total-reflection X-ray fluorescence, sweeping-total-reflection X-ray fluorescence and vapor phase decomposition-total-reflection X-ray fluorescence applied to the characterization of metallic contamination on semiconductor wafers

2008 Spectrochimica Acta Part B: Atomic Spectroscopy
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Thin Films Characterization by Ultra Trace Metrology

2007
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Detection of unknown localized contamination on silicon wafer surface by sweeping-total reflection X-ray fluorescence analysis

2004 Spectrochimica Acta Part B: Atomic Spectroscopy
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Citations (7)