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Tracy Huang
Tracy Huang
KLA-Tencor
Reticle
Optical proximity correction
Wafer
Engineering
Lithography
4
Papers
6
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Wafer plane inspection for advanced reticle defects
2008
Rajesh Nagpal
Firoz Ghadiali
Jun Kim
Tracy Huang
Song Pang
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Citations (3)
Printability impact of progressive defects: ammonium sulfate emulation study
2008
Brian J. Grenon
Tracy Huang
Aditya Dayal
Kaustuve Bhattacharyya
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Citations (1)
A novel run-time MEEF-driven defect disposition extending high resolution contamination inspection to next generation photomask
2007
William Chou
Yung-Feng Cheng
Shih-Ming Yen
James Cheng
Peter Peng
Joe Huang
Tracy Huang
Den Wang
Ellison Chen
Ching Yun Hsiang
Kaustuve Bhattacharyya
Aditya Dayal
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Citations (1)
Automatic optimization of MEEF-driven defect disposition for contamination inspection challenges
2007
Tracy Huang
Aditya Dayal
Kaustuve Bhattacharyya
Joe Huang
William Chou
Yung-Feng Cheng
Shih-Ming Yen
James Cheng
Peter Peng
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Citations (1)
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