Old Web
English
Sign In
Acemap
>
authorDetail
>
Joe Huang
Joe Huang
KLA-Tencor
Reticle
Wafer
Engineering
Mask inspection
Wafer fabrication
4
Papers
3
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Improving COO on KLA-Tencor wafer fab reticle inspections by implementing pixel migration as new STARlight2+ capability
2008
Shih-Ming Yen
Swapnajit Chakravarty
Joe Huang
John Miller
Russell Dover
Den Wang
Show All
Source
Cite
Save
Citations (1)
Inspectability of PSM masks for the 32nm node using STARlight2
2008
Chain Ting Huang
Yung-Feng Cheng
Shih-Ming Kuo
Chun-Hsien Huang
Swapnajit Chakravarty
Joe Huang
Jeff Lin
Den Wang
Show All
Source
Cite
Save
Citations (0)
A novel run-time MEEF-driven defect disposition extending high resolution contamination inspection to next generation photomask
2007
William Chou
Yung-Feng Cheng
Shih-Ming Yen
James Cheng
Peter Peng
Joe Huang
Tracy Huang
Den Wang
Ellison Chen
Ching Yun Hsiang
Kaustuve Bhattacharyya
Aditya Dayal
Show All
Source
Cite
Save
Citations (1)
Automatic optimization of MEEF-driven defect disposition for contamination inspection challenges
2007
Tracy Huang
Aditya Dayal
Kaustuve Bhattacharyya
Joe Huang
William Chou
Yung-Feng Cheng
Shih-Ming Yen
James Cheng
Peter Peng
Show All
Source
Cite
Save
Citations (1)
1