Old Web
English
Sign In
Acemap
>
authorDetail
>
Ching Yun Hsiang
Ching Yun Hsiang
KLA-Tencor
Reticle
Lithography
Photolithography
Mask inspection
Engineering
2
Papers
1
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (2)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Recipe optimization of fab mask inspection for 180~90nm reticles to save inspection time and improve productivity
2007
Eric Haodong Lu
Ching Yun Hsiang
Jim Wang
Jinggang Zhu
Ellison Chen
Kaustuve Bhattacharyya
Show All
Source
Cite
Save
Citations (0)
A novel run-time MEEF-driven defect disposition extending high resolution contamination inspection to next generation photomask
2007
William Chou
Yung-Feng Cheng
Shih-Ming Yen
James Cheng
Peter Peng
Joe Huang
Tracy Huang
Den Wang
Ellison Chen
Ching Yun Hsiang
Kaustuve Bhattacharyya
Aditya Dayal
Show All
Source
Cite
Save
Citations (1)
1