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M. Luo
M. Luo
Motorola
X-ray lithography
Chemical vapor deposition
Anti-reflective coating
Lithography
Optoelectronics
2
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1
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CVD SiN/sub X/ anti-reflective coating for sub-0.5 /spl mu/m lithography
1995
VLSIT | Symposium on VLSI Technology
T. P. Ong
Bernard J. Roman
W. M. Paulson
Jung-Hui Lin
Charles Fredrick King
James D. Hayden
Y.C. Ku
C.C. Fu
M. Luo
C. Philbin
M. Rossow
Thomas C. Mele
K. Kemp
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CVD SiNx Anti-reflective Coating for Sub-OSpm Lithography
1995
Symposium on VLSI Technology
T. P. Ong
Bernard J. Roman
W. M. Paulson
James D. Hayden
M. Luo
C. Philbin
M. Rossow
Thomas C. Mele
K. Kemp
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