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K. Kemp
K. Kemp
Motorola
Photolithography
Lithography
X-ray lithography
Optoelectronics
Electronic engineering
4
Papers
18
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The future of EUV lithography
2003
MNC | International Microprocesses and Nanotechnology Conference
K. Kemp
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CVD SiN/sub X/ anti-reflective coating for sub-0.5 /spl mu/m lithography
1995
VLSIT | Symposium on VLSI Technology
T. P. Ong
Bernard J. Roman
W. M. Paulson
Jung-Hui Lin
Charles Fredrick King
James D. Hayden
Y.C. Ku
C.C. Fu
M. Luo
C. Philbin
M. Rossow
Thomas C. Mele
K. Kemp
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Citations (1)
CVD SiNx Anti-reflective Coating for Sub-OSpm Lithography
1995
Symposium on VLSI Technology
T. P. Ong
Bernard J. Roman
W. M. Paulson
James D. Hayden
M. Luo
C. Philbin
M. Rossow
Thomas C. Mele
K. Kemp
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A quadruple well, quadruple polysilicon BiCMOS process for fast 16 Mb SRAM's
1994
IEEE Transactions on Electron Devices
James D. Hayden
Robert C. Taft
P.U. Kenkare
Carlos A. Mazure
Craig D. Gunderson
Bich Yen Nguyen
M. Woo
Craig S. Lage
Bernard J. Roman
S. Radhakrishna
Ravi Subrahmanyan
Arkalgud R. Sitaram
P. Pelley
Jung-Hui Lin
K. Kemp
Howard C. Kirsch
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Citations (15)
1