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Stacy Figueredo
Stacy Figueredo
Lithography
Optics
Materials science
Actuator
Second moment of area
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An optical device as well as lithography system
2015
Stacy Figueredo
Dirk Jürgens
Ricarda Schömer
Wolfgang Scherm
Franz-Josef Stickel
Christian Mühlke
Pascal Marsollek
Markus Happel
Maarten Dekker
Maurice Teuwen
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Means for generating a cleaning gas, the projection exposure apparatus and method for cleaning an optical surface
2015
Stacy Figueredo
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