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A.L. Esquivel
A.L. Esquivel
Texas Instruments
Electronic engineering
Analytical chemistry
Experimental data
CMOS
Chemical-mechanical planarization
3
Papers
24
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Degradation of deep sub-micron isolation by vacuum ultraviolet radiation from low temperature back end plasma-assisted processes
1997
IEDM | International Electron Devices Meeting
S. Ashburn
S. Krishnan
Girish A. Dixit
Kelly J. Taylor
T. Breedijk
Ih-Chin Chen
M. W. Goodwin
A.L. Esquivel
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Citations (2)
Integration of unit processes in a shallow trench isolation module for a 0.25 μm complementary metal–oxide semiconductor technology
1997
Journal of Vacuum Science & Technology B
Amitava Chatterjee
Iqbal Ali
Keith A. Joyner
Doug Mercer
John Kuehne
Mark E. Mason
A.L. Esquivel
D. Rogers
S OBrien
P. Mei
Suhail Murtaza
S.P. Kwok
Kelly J. Taylor
Somnath S. Nag
Greg A. Hames
Maureen A. Hanratty
H. Marchman
S. Ashburn
Ih-Chin Chen
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Citations (22)
Study of integration issues in shallow trench isolation for deep submicron CMOS technologies
1996
Amitava Chatterjee
Mark E. Mason
Keith A. Joyner
D. Rogers
Doug Mercer
John Kuehne
A.L. Esquivel
P. Mei
Suhail Murtaza
Kelly J. Taylor
Iqbal Ali
Somnath S. Nag
Sean C. O'Brien
S. Ashburn
Ih-Chin Chen
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