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Ben-Chang Chen

6

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19

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Reduction of substrate alkaline contamination by utilizing multi-layer bottom antireflective coating structures in ArF lithography

2001 MNC | International Microprocesses and Nanotechnology Conference
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Elimination of Dielectric Degradation for Chemical-Mechanical Planarization of Low-k Hydrogen Silisesquioxane

2001 Japanese Journal of Applied Physics
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Direct patterning on low dielectric constant materials with electron beam lithography

2001 MNC | International Microprocesses and Nanotechnology Conference
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Thermal flow and chemical shrink techniques for sub-100 nm contact hole fabrication in electron beam lithography

2001 MNC | International Microprocesses and Nanotechnology Conference
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Chemically amplified deep UV resists for electron-beam lithography applications

2001
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