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Yasuji Matsui

9

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36

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Critical-dimension control for 130-nm patterns in x-ray lithography

1999 Journal of Photopolymer Science and Technology
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EB-X3: New electron-beam x-ray mask writer

1999 Journal of Vacuum Science & Technology B
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Effect of Electron Beam Orbit Distortion on Optical Performance of the Synchrotron Radiation Lithography Beamline.

1994 Japanese Journal of Applied Physics
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