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Critical-dimension control for 130-nm patterns in x-ray lithography
Critical-dimension control for 130-nm patterns in x-ray lithography
1999
Yuusuke Tanaka
Toshiyuki Iwamoto
Kiyoshi Fujii
Yukiko Kikuchi
Yasuji Matsui
Keywords:
X-ray lithography
Photochemistry
Critical dimension
Molecular physics
Materials science
Optoelectronics
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