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Ryohei Kitao
Ryohei Kitao
Renesas Electronics
Electronic engineering
Materials science
Copper interconnect
CMOS
Optoelectronics
4
Papers
4
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0
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Behavior of the alloying element in Cu interconnects
2011
IITC | International Interconnect Technology Conference
Ryohei Kitao
Kaori Noda
Emiko Nakazawa
Yasuaki Tsuchiya
Kunihiro Fujii
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Effects of metal-cap coverage on electro-migration (EM) tolerance for scaled-down Cu interconnects
2011
IITC | International Interconnect Technology Conference
M. Ueki
E. Nakazawa
Ryohei Kitao
S. Hiroshima
T. Kurokawa
N. Furutake
Hironori Yamamoto
Naoya Inoue
Yasuaki Tsuchiya
Yoshihiro Hayashi
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Citations (2)
RF Performance Boosting for 40nm-node CMOS Device by Low-k/Cu Dual Damascene Contact
2009
J. Kawahara
Kenichiro Hijioka
I. Kume
H. Nagase
A. Tanabe
Makoto Ueki
H. Yamamoto
T Fukai
Koji Arita
K. Motoyama
Ryohei Kitao
K. Fujii
M Ikeda
Yasuhide Hayashi
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RF performance boosting for 40nm-node CMOS device by low-k/Cu dual damascene contact
2008
IEDM | International Electron Devices Meeting
J. Kawahara
Kenichiro Hijioka
I. Kume
H. Nagase
A. Tanabe
Makoto Ueki
H. Yamamoto
Fuminori Ito
Naoya Inoue
M. Tagami
N. Furutake
T. Onodera
S. Saito
Tsuneo Takeuchi
T Fukai
M. Asada
Koji Arita
K. Motoyama
Atsushi Nakajima
E. Nakazawa
Ryohei Kitao
K. Fujii
M. Sekine
M Ikeda
Yasuhide Hayashi
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