Old Web
English
Sign In
Acemap
>
authorDetail
>
Mitsushi Minato-ku Ikeda
Mitsushi Minato-ku Ikeda
Toshiba
Sputtering
Engineering physics
Materials science
Thin film
Manufacturing engineering
3
Papers
0
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (3)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
X-ray area detector
2001
Masaki Atsuta
Mitsushi Minato-ku Ikeda
Akira Minato-ku Kinno
Yasuhiro Minato-ku Sugawara
Manabu Minato-ku Tanaka
Show All
Source
Cite
Save
Citations (0)
6.4 MoW Gate Line Improvement with Kr Gas Sputtering(6.THIN FILM MATERIALS AND DEPOSITION)(1999 Display Manufacturing Technology Conference Report)
1999
Mitsushi Minato-ku Ikeda
Yujiro Hara
Masaki Atsuta
Yoshiko Tsuji
Toshiyuki Oka
K. Suzuki
Momoko Takemura
Hideyasu Tsuji
Show All
Source
Cite
Save
Citations (0)
Low resistance Mo-W alloy gate line for TFT-LCDs
1996
IEICE technical report. Electronic information displays
Toshiyuki Oka
Masaki Atsuta
Yujiro Hara
Yoshiko Tsuji
Mitsushi Minato-ku Ikeda
Y. Ogawa
Momoko Takemura
K. Suzuki
Y. Kataoka
Y Shigemitsu
Hideyasu Tsuji
T. Dohi
K. Mori
Show All
Source
Cite
Save
Citations (0)
1