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Werner Saule
Werner Saule
Materials science
Resist
Composite material
Photomask
Substrate (chemistry)
7
Papers
11
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Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback
2004
Lothar Berger
Werner Saule
Peter Dress
Thomas M. Gairing
Chia-Jen Chen
Hsin-Chang Lee
Hung-Chang Hsieh
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Citations (2)
Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback
2004
Hsin-Chang Lee
Chia-Jen Chen
Hung-Chang Hsieh
Lothar Berger
Werner Saule
P. Dress
Thomas M. Gairing
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Comparison of new film nozzle with standard nozzle for aqueous puddle developing of photomasks
2003
Christian Buergel
Werner Saule
Marlene Strobl
Peter Dress
Anatol Schwersenz
Martin Tschinkl
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Nozzle arrangement for applying a fluid to a substrate
2002
Christian Bürgel
Peter Dr. Dreß
Andreas Nöring
Werner Saule
Anatol Schwersenz
Marlene Strobl
Martin Tschinkl
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