ARRAYS OF METALLIC NANOPILLARS IN HOLES FOR PLASMONIC DEVICES

We have developed a well-ordered metallic array of nanopillars in nanoholes fabricated simply by magnetron sputtering into a plastic nanohole array over a large area. The pillar height and pillar-hole gap were controllable to nanometer scales through the sputtering time and initial nanohole design, constructed by a nanoimprint technique with high reproducibility. Our new fabrication method, without any resist, etching, or lift-off process, is simpler than previous methods [1]. By using this substrate, we observed a new plasmon resonance dip, related to the nanogaps in reflection spectra from the nanopillarhole array. This unique fabrication method will be utilized to study highly sensitive plasmonic devices and surface enhanced Raman scattering (SERS) active substrates.