Multilayers for X-Ray Optics: Production by Diode Sputtering and Characterization by Microcleavage Transmission Electron Microscopy
1987
A multilayer with 99 bi-layers and a 2.5 nm period made of carbon and tungsten has been produced as a test sample for a diode sputtering apparatus and process. The process included Microcleavage Transmission Electron Microscopy as a rapid characterization method.
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