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Investigation of Atomic-layer Defect-free Ge Etching by HBr Neutral Beam
Investigation of Atomic-layer Defect-free Ge Etching by HBr Neutral Beam
2019
Daisuke Ohori
Takuya Fujii
Shuichi Noda
Wataru Mizubayashi
Kazuhiko Endo
Yiming Li
Yao-Jen Lee
Takuya Ozaki
Seiji Samukawa
Keywords:
Etching
Optoelectronics
Beam (structure)
Materials science
defect free
Correction
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