Quantitative Auger electron spectroscopy for refractory metal silicides

Quantitative AES analysis is carried out on Cr–Si and Mo–Si systems. The treatment is based on the introduction of matrix and sputter correction factors. The matrix correction factors are calculated along the lines outlined in literature and proved to be weakly dependent on composition. Comparison with experimental data obtained on scratched surfaces of MoSi2 and Cr3Si bulk samples showed good agreement between experimental and nominal composition ratios. The sputter correction factors were found to be strongly dependent on composition for both systems. Comparison with theory for the case of preferential sputtering as the dominant ejection mechanism yields agreement with the experiment only for samples with low Si content. This is believed to be due to superposition with recoil location of the heavier component.