Deep lithography with a low energy synchrotron source: fabrication of X-ray refractive single lenses

Lithography as deep as 400 μm has been carried out to fabricate X-rays refractive lenses using a low energy synchrotron source (AURORA-2 S, 0.7 GeV). The lens made of PMMA has two parabolic curvatures with radii R=4 μm and apertures A=2(2Rz)1/2=179 μm, thus the aspect ratio z/R=250 for its curvatures, which is too great for traditional techniques to achieve. Upon fabrication of the lenses, precision of the curvatures has been evaluated by digital imaging analysis. The lens can singly focus a beam of hard X-rays into several microns at a reasonable focal length F=1.5 m. Advantages of using a low energy source for the LIGA process will be discussed regarding problems such as thick absorbers demanded by the LIGA mask and heat-load occurring in thick resist layers.