Innovative deposition techniques for the fabrication of polycrystalline thin‐film photovoltaics

A key issue for photovoltaics (PV), both in terrestrial and future space applications, is [ital producibility], particularly for applications utilizing a large volume of PV. Among the concerns for fabrication of polycrystalline thin-film photovoltaics, such as copper-indium-diselenide (CIS) and cadmium-telluride (CdTe), are production volume, which translates directly related to cost, and minimization of waste. Both the rotating cylindrical magnetron (C-Mag[sup TM]) and pulsed electrodeposition have tremendous potential for the fabrication of polycrystalline thin-film photovoltaics due to scaleability, efficient utilization of source materials and inherently higher deposition rates. In the case of sputtering, the unique geometry of the C-Mag[sup TM] facilitates innovative cosputtering and reactive sputtering that could lead to greater throughput, reduced health and safety risks, and ultimately lower fabrication cost. For pulsed electrodeposition, the films appear to be more tightly adherent and deposited at an enhanced rate when compared to conventional DC electrodeposition. This paper addresses Martin Marietta's investigation into innovative sputtering techniques and pulsed electrodeposition with a near-term goal of 930 cm[sup 2] (1 ft[sup 2]) monolithically-integrated CIS and CdTe submodules.