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The Multi Arrayed Micro-scale Electron Optical System for Electron Beam Lithography using MEMS Technology
The Multi Arrayed Micro-scale Electron Optical System for Electron Beam Lithography using MEMS Technology
2002
Hak Joong Kim
Changho Han
Kiyong Lee
Hyeongwoo Seo
Kukjin Chun
Keywords:
Computer science
X-ray lithography
Stencil lithography
Electron-beam lithography
Electron optics
Optics
Electron
Microelectromechanical systems
Correction
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