Evaluation of microstructure and residual stress in W/B4C multilayer optics

The microstructure and residual stress are investigated in W/B4C x-ray multilayer (ML) mirrors as a function of the number of layer pairs (N) varying from 20 to 400 at a fixed period, d ≈ 1.9 nm. The microstructure is analyzed using the x-ray reflectivity (XRR) and rocking scan methods. The total residual stress in the ML film is derived using the substrate curvature measurement method, whereas the stress in W layers of MLs is separately determined by grazing incidence x-ray diffraction measurements based on the sin2 χ method using synchrotron. The successive order Bragg peaks in XRR measured curves indicate good quality of the ML structure in terms of interface roughness and thickness errors. As N increases, the interface width of B4C and W varies in the range of 0.15–0.22 nm and 0.26–0.44 nm, respectively. The contribution of physical roughness to the interface width is significantly lower (∼sub-angstrom) compared to interfacial diffuseness (angstrom level) along with a small (few nanometers) correlatio...