Polyimide-based organic thin films prepared by rf magnetron sputtering

Abstract Organic thin films were sputter-deposited onto glass substrates in an N 2 /CF 4 mixture discharge gas using a polyimide (Kapton) target. FTIR observation showed that the thin films contained imide bases. The compositions of the films determined by XPS depended on CF 4 concentration in the gas and F included films were obtained. The surface energy of the thin films measured by the contact angle method ranged between 17 and 64 mJ/m 2 . The dielectric constant of the thin films at 1 MHz was measured and the lowest dielectric constant e was approximately 2.0.